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Proceedings Paper

Solution for high-order distortion on extreme illumination condition using computational prediction method
Author(s): Young-Seog Kang; Hunhwan Ha; Jang-Sun Kim; Ju Hee Shin; Young Ha Kim; Young Sun Nam; Young-Sin Choi; Cedric Affentauschegg; Rob W. van der Heijden; Umar Rizvi; Bernd Geh; Eric Janda; Jan Baselmans; Stefan van der Sanden; Oh-Sung Kwon; Mariya Ponomarenko; Daan Slotboom
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Paper Abstract

In this paper we present the limitations of 3rd order distortion corrections based on standard overlay metrology and propose a new method to quantify and correct the cold-lens aberration fingerprint. As a result of continuous shrinking features of the integrated circuit, the overlay budget requirements have become very demanding. Historically, most overlay enhancements were achieved by hardware improvements. However there also is a benefit in the computational approach, and so we looked for solutions for overlay improvements in process variation with computational applications.

Paper Details

Date Published: 18 March 2015
PDF: 10 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942608 (18 March 2015); doi: 10.1117/12.2086938
Show Author Affiliations
Young-Seog Kang, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Hunhwan Ha, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Jang-Sun Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Ju Hee Shin, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Ha Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young Sun Nam, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Young-Sin Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Cedric Affentauschegg, ASML Netherlands B.V. (Netherlands)
Rob W. van der Heijden, ASML Netherlands B.V. (Netherlands)
Umar Rizvi, ASML Netherlands B.V. (Netherlands)
Bernd Geh, Carl Zeiss SMT Inc. (United States)
Eric Janda, ASML US, Inc. (United States)
Jan Baselmans, ASML Netherlands B.V. (Netherlands)
Stefan van der Sanden, ASML Netherlands B.V. (Netherlands)
Oh-Sung Kwon, ASML Korea Co., Ltd. (Korea, Republic of)
Mariya Ponomarenko, ASML Netherlands B.V. (Netherlands)
Daan Slotboom, ASML Netherlands B.V. (Netherlands)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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