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Proceedings Paper

Femtosecond laser system for micromachining of the materials
Author(s): R. Barbucha; M. Kocik; M. Tański; K. Garasz; T. Petrov; C. Radzewicz
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Paper Abstract

Femtosecond–pulse laser micromachining is based on a laser ablation phenomenon, i.e. total evaporation of material from the target surface during laser irradiation. It is the most precise method of material removal. Moreover it does not require any post processing. Removal of the material occurs only in the laser focus, since the lack of thermal interaction, neither heat affected zone (HAZ) nor debris ocur. Research results have shown that shortening the duration of the laser pulse significantly reduces HAZ, which translates into the high quality of the machined structures. It is the main argument for the use of femtosecond-pulse lasers in the precise micromachining. In this paper, a femtosecond laser system consisting of a solid-state oscillator and the ytterbium-doped pulse fiber amplifier are presented. Average beam power at 343 nm with mode-locking is 4W @25A and pulse length at the oscillator output is 500 fs. Laser micro and nano-machining has found application in different fields. It’s primary use is industrial micromachining of metals, ceramics, polymers, glass, biological material for medical use in eye surgery, and photovoltaic cells.

Paper Details

Date Published: 8 January 2015
PDF: 6 pages
Proc. SPIE 9447, 18th International School on Quantum Electronics: Laser Physics and Applications, 94470J (8 January 2015); doi: 10.1117/12.2086473
Show Author Affiliations
R. Barbucha, Szewalski Institute of Fluid-Flow Machinery (Poland)
M. Kocik, Szewalski Institute of Fluid-Flow Machinery (Poland)
M. Tański, Szewalski Institute of Fluid-Flow Machinery (Poland)
K. Garasz, Szewalski Institute of Fluid-Flow Machinery (Poland)
T. Petrov, Institute of Solid State Physics (Bulgaria)
C. Radzewicz, Institute of Physical Chemistry (Poland)


Published in SPIE Proceedings Vol. 9447:
18th International School on Quantum Electronics: Laser Physics and Applications
Tanja Dreischuh; Sanka Gateva; Alexandros Serafetinides, Editor(s)

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