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Proceedings Paper

Modeling of bi-spectral primary source for the EUV lithography
Author(s): A. P. Zhevlakov; R. P. Seisyan; V. G. Bespalov; V. V. Elizarov; A. S. Grishkanich; S. V. Kascheev
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Paper Abstract

It is shown that the power consumption in the double-pulse bi-spectral primary source for EUV lithography can be substantially decrease by replacing pre-amplifiers in power CO2 laser with the SRS converters wavelength 1.06 μm to 10.6 μm while maintaining efficiency of EUV radiation output of illuminated plasma.

Paper Details

Date Published: 19 March 2015
PDF: 14 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94222M (19 March 2015); doi: 10.1117/12.2086272
Show Author Affiliations
A. P. Zhevlakov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
R. P. Seisyan, Ioffe Physical-Technical Institute (Russian Federation)
V. G. Bespalov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
V. V. Elizarov, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
A. S. Grishkanich, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)
S. V. Kascheev, National Research Univ. of Information Technologies, Mechanics and Optics (Russian Federation)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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