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Proceedings Paper

Performance of ETC controller in high-volume production
Author(s): Joshua Thornes; Kevin O'Brien; Hoang Dao; David Dunlap; Ronnie Flores; Matt Lake; Aleks Simic; Brian Wehrung; John Wyman; Will Conley
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Paper Abstract

As chipmakers continue to reduce feature sizes and shrink CDs on the wafer to meet customer needs, Cymer continues developing light sources that enable advanced lithography, and introducing innovations to improve productivity, wafer yield, and cost of ownership. In particular, the ETC controller provides improved spectral bandwidth and wavelength stability, which enables superior CD control and wafer yield for the chipmaker. This controller is a key technology in Cymer’s XLR 700ix and DynaPulseTM products. Last year we reported that the XLR 600ix incorporates new controller technology called ETC for improvements in spectral bandwidth and wavelength stability. The Authors will present metrics demonstrating the performance and stability of systems that have been installed at chipmaker sites over the last year.

Paper Details

Date Published: 18 March 2015
PDF: 6 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942625 (18 March 2015); doi: 10.1117/12.2086102
Show Author Affiliations
Joshua Thornes, Cymer LLC (United States)
Kevin O'Brien, Cymer LLC (United States)
Hoang Dao, Cymer LLC (United States)
David Dunlap, Cymer LLC (United States)
Ronnie Flores, Cymer LLC (United States)
Matt Lake, Cymer LLC (United States)
Aleks Simic, Cymer LLC (United States)
Brian Wehrung, Cymer LLC (United States)
John Wyman, Cymer LLC (United States)
Will Conley, Cymer LLC (United States)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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