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Proceedings Paper

Stack and topography verification as an enabler for computational metrology target design
Author(s): Michael E. Adel; Inna Tarshish-Shapir; David Gready; Mark Ghinovker; Chen Dror; Stephane Godny
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Paper Abstract

Computational metrology target design requires both an accurate metrology simulation engine and an accurate geometric model. This paper deals with the later. Optical critical dimension metrology and cross-section SEM are demonstrated as two useful methods of geometric model verification with differing capabilities. Specifically, a methodology is proposed which allows the metrology engineer to quantify the level of accuracy required by the model as a function of the tolerable uncertainty in the prediction of metrology performance metrics. The methodology identifies a subset of model parameters which need to be verified enabling the metrology engineer to invest the minimum effort in stack and topography verification which will lead to performing target designs on the first design round.

Paper Details

Date Published: 10 April 2015
PDF: 10 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240D (10 April 2015); doi: 10.1117/12.2086084
Show Author Affiliations
Michael E. Adel, KLA-Tencor Israel (Israel)
Inna Tarshish-Shapir, KLA-Tencor Israel (Israel)
David Gready, KLA-Tencor Israel (Israel)
Mark Ghinovker, KLA-Tencor Israel (Israel)
Chen Dror, KLA-Tencor Israel (Israel)
Stephane Godny, IMEC (Belgium)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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