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Proceedings Paper

EUV patterning improvement toward high-volume manufacturing
Author(s): Yuhei Kuwahara; Koichi Matsunaga; Shinichiro Kawakami; Kathleen Nafus; Philippe Foubert; Anne-Marie Goethals
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Paper Abstract

Extreme ultraviolet lithography (EUVL) technology is a promising candidate for a semiconductor process for 18nm half pitch and beyond. So far, the studies of EUV for manufacturability have been focused on particular aspects. It still requires fine resolution, uniform and smooth patterns, and low defectivity, not only after lithography but also after the etch process. Tokyo Electron Limited and imec are continuously collaborating to improve manufacturing quality of the process of record (POR) on a CLEAN TRACKTM LITHIUS ProTMZ-EUV. This next generation coating/developing system has been upgraded with defectivity reduction enhancements which are applied along with TELTM best known methods. We have evaluated process defectivity post lithography and post etch. Apart from defectivity, FIRMTM rinse material and application compatibility with sub 18nm patterning is improved to prevent line pattern collapse and increase process window on next generation resist materials. This paper reports on the progress of defectivity and patterning performance optimization towards the NXE:3300 POR.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221X (19 March 2015); doi: 10.1117/12.2086080
Show Author Affiliations
Yuhei Kuwahara, Tokyo Electron Kyushu Ltd. (Belgium)
Koichi Matsunaga, Tokyo Electron Kyushu Ltd. (Japan)
Shinichiro Kawakami, Tokyo Electron Kyushu Ltd. (Japan)
Kathleen Nafus, Tokyo Electron Kyushu Ltd. (Belgium)
Philippe Foubert, IMEC (Belgium)
Anne-Marie Goethals, IMEC (Belgium)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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