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Proceedings Paper

Understanding of PS-b-PMMA phase segregation under laser-induced millisecond thermal annealing
Author(s): Alan G. Jacobs; Clemens Liedel; Christopher K. Ober; Michael O. Thompson
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Paper Abstract

Laser thermal annealing of PS-b-PMMA is shown to modify phase segregation within the milliseconds timeframe at temperatures from the glass transition to far above the order-disorder transition temperature. We report the kinetics of phase segregation of cylinder forming PS-b-PMMA (53.8 kg/mol, fPS = 0.7) as probed by micro-beam grazing incidence small angle X-ray scattering. Structure evolution was probed as a function of peak temperature, time at temperature, and quench rate, with phase segregation readily occurring on millisecond time scales and at peak quench rates up to 107 K/s. The final film morphology is dependent on both the anneal time and the quench rate to ambient. With heating to sufficiently high temperatures, the thermal history is erased yielding a final state is purely dependent on the quench rate.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942309 (19 March 2015); doi: 10.1117/12.2086057
Show Author Affiliations
Alan G. Jacobs, Cornell Univ. (United States)
Clemens Liedel, Cornell Univ. (United States)
Christopher K. Ober, Cornell Univ. (United States)
Michael O. Thompson, Cornell Univ. (United States)

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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