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Proceedings Paper

Signal response metrology (SRM): a new approach for lithography metrology
Author(s): Stilian Pandev; Fang Fang; Young Ki Kim; Jamie Tsai; Alok Vaid; Lokesh Subramany; Dimitry Sanko; Vidya Ramanathan; Ren Zhou; Kartik Venkataraman; Ronny Haupt
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Paper Abstract

CD uniformity requirements at 20nm and more advanced nodes have challenged the precision limits of CD-SEM metrology, conventionally used for scanner qualification and in-line focus/dose monitoring on product wafers. Optical CD metrology has consequently gained adoption for these applications because of its superior precision, but has been limited adopted, due to challenges with long time-to-results and robustness to process variation. Both of these challenges are due to the limitations imposed by geometric modeling of the photoresist (PR) profile as required by conventional RCWA-based scatterometry. Signal Response Metrology (SRM) is a new technique that obviates the need for geometric modeling by directly correlating focus, dose, and CD to the spectral response of a scatterometry tool. Consequently, it suggests superior accuracy and robustness to process variation for focus/dose monitoring, as well as reducing the time to set up a new measurement recipe from days to hours. This work describes the fundamental concepts of SRM and the results of its application to lithography metrology and control. These results include time to results and measurement performance data on Focus, Dose and CD measurements performed on real devices and on design rule metrology targets.

Paper Details

Date Published: 19 March 2015
PDF: 14 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241P (19 March 2015); doi: 10.1117/12.2086056
Show Author Affiliations
Stilian Pandev, KLA-Tencor Corp. (United States)
Fang Fang, GLOBALFOUNDRIES Inc. (United States)
Young Ki Kim, GLOBALFOUNDRIES Inc. (United States)
Jamie Tsai, GLOBALFOUNDRIES Inc. (United States)
Alok Vaid, GLOBALFOUNDRIES Inc. (United States)
Lokesh Subramany, GLOBALFOUNDRIES Inc. (United States)
Dimitry Sanko, KLA-Tencor Corp. (United States)
Vidya Ramanathan, KLA-Tencor Corp. (United States)
Ren Zhou, KLA-Tencor Corp. (United States)
Kartik Venkataraman, KLA-Tencor Corp. (United States)
Ronny Haupt, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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