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Proceedings Paper

Experiments using automated sample plan selection for OPC modeling
Author(s): Ramya Viswanathan; Om Jaiswal; Nathalie Casati; Amr Abdo; James Oberschmidt; Josef Watts; Maria Gabrani
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Paper Abstract

OPC models have become critical in the manufacturing of integrated circuits (ICs) by allowing correction of complex designs, as we approach the physical limits of scaling in IC chip design. The accuracy of these models depends upon the ability of the calibration set to sufficiently cover the design space, and be manageable enough to address metrology constraints. We show that the proposed method provides results of at least similar quality, in some cases superior quality compared to both the traditional method and sample plan sets of higher size. The main advantage of our method over the existing ones is that it generates a calibration set much faster, considering a large initial set and even more importantly, by automatically selecting its minimum optimal size.

Paper Details

Date Published: 18 March 2015
PDF: 10 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 94260W (18 March 2015); doi: 10.1117/12.2086049
Show Author Affiliations
Ramya Viswanathan, IBM Mircoelectronics SRDC (United States)
Om Jaiswal, IBM Mircoelectronics SRDC (India)
Nathalie Casati, IBM Research - Zürich (Switzerland)
Amr Abdo, IBM Mircoelectronics SRDC (United States)
James Oberschmidt, IBM Mircoelectronics SRDC (United States)
Josef Watts, IBM Mircoelectronics SRDC (United States)
Maria Gabrani, IBM Research - Zürich (Switzerland)

Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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