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Proceedings Paper

Base developable negative tone molecular resist based on epoxide cross-linking
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Paper Abstract

A negative tone, aqueous base developable molecular glass resist, 3Ep, is presented that is developable in both standard organic solvents and aqueous base developers. The resist shows slightly better imaging performance in organic solvent versus aqueous base and shows a shift of E0 away from zero dose. Compared to a previously reported 4Ep resist, 3Ep appears to have a more controlled polymerization rate at equivalent conditions, which results in higher-quality patterned features. 3Ep also requires use of an underlayer to avoid de-wetting during aqueous base development.

Paper Details

Date Published: 20 March 2015
PDF: 8 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251S (20 March 2015); doi: 10.1117/12.2086039
Show Author Affiliations
Brandon Sharp, Georgia Institute of Technology (United States)
Richard A. Lawson, Georgia Institute of Technology (United States)
Ashten Fralick, Georgia Institute of Technology (United States)
Hannah Narcross, Georgia Institute of Technology (United States)
Jun Sung Chun, SEMATECH Inc. (United States)
SUNY Polytechnic Institute (United States)
Mark Neisser, SEMATECH Inc. (United States)
Laren M. Tolbert, Georgia Institute of Technology (United States)
Clifford L. Henderson, Georgia Institute of Technology (United States)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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