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Proceedings Paper

Carbon dioxide gas purification and analytical measurement for leading edge 193nm lithography
Author(s): Sarah Riddle Vogt; Cristian Landoni; Chuck Applegarth; Matt Browning; Marco Succi; Simona Pirola; Giorgio Macchi
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Paper Abstract

The use of purified carbon dioxide (CO2) has become a reality for leading edge 193 nm immersion lithography scanners. Traditionally, both dry and immersion 193 nm lithographic processes have constantly purged the optics stack with ultrahigh purity compressed dry air (UHPCDA). CO2 has been utilized for a similar purpose as UHPCDA. Airborne molecular contamniation (AMC) purification technologies and analytical measurement methods have been extensively developed to support the Lithography Tool Manufacturers purity requirements. This paper covers the analytical tests and characterizations carried out to assess impurity removal from 3.0 N CO2 (beverage grade) for its final utilization in 193 nm and EUV scanners.

Paper Details

Date Published: 19 March 2015
PDF: 11 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242N (19 March 2015); doi: 10.1117/12.2085963
Show Author Affiliations
Sarah Riddle Vogt, SAES Pure Gas, Inc. (United States)
Cristian Landoni, SAES Getters S.p.A. (Italy)
Chuck Applegarth, SAES Pure Gas, Inc. (United States)
Matt Browning, SAES Pure Gas, Inc. (United States)
Marco Succi, SAES Getters S.p.A. (Italy)
Simona Pirola, SAES Getters S.p.A. (Italy)
Giorgio Macchi, SAES Getters S.p.A. (Italy)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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