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Proceedings Paper

A pattern-based methodology for optimizing stitches in double-patterning technology
Author(s): Lynn T.-N. Wang; Sriram Madhavan; Vito Dai; Luigi Capodieci
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Paper Abstract

A pattern-based methodology for optimizing stitches is developed based on identifying stitch topologies and replacing them with pre-characterized fixing solutions in decomposed layouts. A topology-based library of stitches with predetermined fixing solutions is built. A pattern-based engine searches for matching topologies in the decomposed layouts. When a match is found, the engine opportunistically replaces the predetermined fixing solution: only a design rule check error-free replacement is preserved. The methodology is demonstrated on a 20nm layout design that contains over 67 million, first metal layer stitches. Results show that a small library containing 3 stitch topologies improves the stitch area regularity by 4x.

Paper Details

Date Published: 18 March 2015
PDF: 10 pages
Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942704 (18 March 2015); doi: 10.1117/12.2085955
Show Author Affiliations
Lynn T.-N. Wang, GLOBALFOUNDRIES Inc. (United States)
Sriram Madhavan, GLOBALFOUNDRIES Inc. (United States)
Vito Dai, GLOBALFOUNDRIES Inc. (United States)
Luigi Capodieci, GLOBALFOUNDRIES Inc. (United States)


Published in SPIE Proceedings Vol. 9427:
Design-Process-Technology Co-optimization for Manufacturability IX
John L. Sturtevant; Luigi Capodieci, Editor(s)

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