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Proceedings Paper

Application of differential phase contrast imaging to EUV mask inspection: a numerical study
Author(s): Xibin Zhou; Dominic Ashworth; Frank Goodwin; Kevin Cummings
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Paper Abstract

We demonstrate numerically that oblique off-axis illumination could enhance the contrast and extend the depth of focus of EUV phase defects detection. In addition to quantitative observation, it also allows us to extract the resolution-limited defect phase profiles quantitatively. This scheme can be easily implemented in both full field and scanning mask inspection tools.

Paper Details

Date Published: 6 April 2015
PDF: 7 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221E (6 April 2015); doi: 10.1117/12.2085945
Show Author Affiliations
Xibin Zhou, SEMATECH Inc. (United States)
Dominic Ashworth, SEMATECH Inc. (United States)
Frank Goodwin, SEMATECH Inc. (United States)
Kevin Cummings, SEMATECH Inc. (United States)

Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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