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Proceedings Paper

Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope
Author(s): Lukas Bahrenberg; Stefan Herbert; Jenny Tempeler; Aleksey Maryasov; Oskar Hofmann; Serhiy Danylyuk; Rainer Lebert; Peter Loosen; Larissa Juschkin
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Paper Abstract

The authors report on experimental and simulative scattering analyses of phase and amplitude defects found in extreme ultraviolet multilayer mirrors, such as mask blanks for EUV lithography. The goal of the analyses is to develop a novel mask blank inspection procedure using one single inspection tool that allows to determine whether a defect is a surface type (amplitude) defect, or a buried type (phase) defect. The experiments were carried out with an actinic dark-field reflection microscope. Programmed defects of both types were fabricated, using different nanostructuring techniques. Analytical and rigorous scattering simulations were carried out to predict and support the experimental results.

Paper Details

Date Published: 13 March 2015
PDF: 9 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942229 (13 March 2015); doi: 10.1117/12.2085929
Show Author Affiliations
Lukas Bahrenberg, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Stefan Herbert, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Jenny Tempeler, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Aleksey Maryasov, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Oskar Hofmann, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Serhiy Danylyuk, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Rainer Lebert, Bruker ASC (Germany)
Peter Loosen, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)
Larissa Juschkin, RWTH Aachen Univ. (Germany)
JARA - Fundamentals of Future Information Technology (Germany)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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