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Proceedings Paper

DRAM memory array edge optimization for advanced NTD resist platforms
Author(s): Juergen Preuninger; Rainer Zimmermann; Bernd Küchler; Thomas Mülders; Jin-Hyuck Jeon; Shinyoung Kim; Chan-Ha Park; Hyun-Jo Yang; Ulrich Klostermann
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Paper Details

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Proc. SPIE 9426, Optical Microlithography XXVIII, ; doi: 10.1117/12.2085928
Show Author Affiliations
Juergen Preuninger, Synopsys GmbH (Germany)
Rainer Zimmermann, Synopsys GmbH (Germany)
Bernd Küchler, Synopsys GmbH (Germany)
Thomas Mülders, Synopsys GmbH (Germany)
Jin-Hyuck Jeon, SK Hynix, Inc. (Korea, Republic of)
Shinyoung Kim, SK Hynix, Inc. (Korea, Republic of)
Chan-Ha Park, SK Hynix, Inc. (Korea, Republic of)
Hyun-Jo Yang, SK Hynix, Inc. (Korea, Republic of)
Ulrich Klostermann, Synopsys GmbH (Germany)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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