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Proceedings Paper

A diffractometer for quality control in nano fabrication processing based on subwavelength diffraction
Author(s): Martin Kreuzer; Jordi Gomis Bresco; Marianna Sledzinska; Clivia M. Sotomayor Torres
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Paper Abstract

Mass production of nanostructured surfaces relies on the periodic repetition of micrometre scale patterns. A unit cell with nanometre features in the micrometre size range is repeated thousands of times. The ensemble can used as a diffraction grating for visible light. The relative intensity distribution of the diffraction orders is characteristic for the grating and sensitive to nanometre scale changes. A newly designed subwavelength diffraction setup allows the measurement in real time of the diffraction pattern of an illuminated polymer grating with only one detector image. The setup records diffraction patterns of, for example, polymer gratings with intentionally low scattering contrast and line features ranging from 610 to 80 nm. Thus, sub-100 nm features can be traced. The comparison of the measured diffraction patterns with simulated patterns allows to sense nanometre scale deviations from fabrication goals.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942426 (19 March 2015); doi: 10.1117/12.2085924
Show Author Affiliations
Martin Kreuzer, Institut Català de Nanociència i Nanotecnologia (Spain)
Jordi Gomis Bresco, Institut Català de Nanociència i Nanotecnologia (Spain)
Marianna Sledzinska, Institut Català de Nanociència i Nanotecnologia (Spain)
Clivia M. Sotomayor Torres, Institut Català de Nanociència i Nanotecnologia (Spain)
Institucio Catalana de Recerca i Estudis Avançats (Spain)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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