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Proceedings Paper

Impact of a SADP flow on the design and process for N10/N7 metal layers
Author(s): W. Gillijns; S. M. Y. Sherazi; D. Trivkovic; B. Chava; B. Vandewalle; V. Gerousis; P. Raghavan; J. Ryckaert; K. Mercha; D. Verkest; G. McIntyre; K. Ronse
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Paper Abstract

This work addresses the difficulties in creating a manufacturable M2 layer based on an SADP process for N10/N7 and proposes a couple of solutions. For the N10 design, we opted for a line staggering approach in which each line-end ends on a contact. We highlight the challenges to obtain a reasonable process window, both in simulation as on based on exposures on wafer. The main challenges come from a very complex keep mask, consisting of complicated 2D structures which are very challenging for 193i litho. Therefore, we propose a solution in which we perform a traditional LELE process on top of a mandrel layer. Towards N7 we show that a line staggering approach starts to break down and design needs to allow better process window for lithography by having metal lines ending in an aligned fashion. has many challenges and we propose to switch to a line cut approach. A more lithography friendly approach is needed for design where the lines end at aligned points so that the process window can be enhanced.

Paper Details

Date Published: 18 March 2015
PDF: 9 pages
Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942709 (18 March 2015); doi: 10.1117/12.2085923
Show Author Affiliations
W. Gillijns, IMEC (Belgium)
S. M. Y. Sherazi, IMEC (Belgium)
D. Trivkovic, IMEC (Belgium)
B. Chava, IMEC (Belgium)
B. Vandewalle, Brion Technologies, Inc. (United States)
V. Gerousis, Cadence Design Systems, Inc. (United States)
P. Raghavan, IMEC (Belgium)
J. Ryckaert, IMEC (Belgium)
K. Mercha, IMEC (Belgium)
D. Verkest, IMEC (Belgium)
G. McIntyre, IMEC (Belgium)
K. Ronse, IMEC (Belgium)


Published in SPIE Proceedings Vol. 9427:
Design-Process-Technology Co-optimization for Manufacturability IX
John L. Sturtevant; Luigi Capodieci, Editor(s)

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