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Proceedings Paper

Breaking through 1D layout limitations and regaining 2D design freedom part II: stitching yield modeling and optimization
Author(s): Jun Zhou; Hongyi Liu; Ting Han; Yijian Chen
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Paper Abstract

In this paper, a stitch database is built from various identified stitching structures in an open-cell layout library. The corresponding stitching yield models are developed for the hybrid optical and self-aligned multiple patterning (hybrid SAMP). Based on the concept of probability-of-success (POS) function, we first develop a single-stitching yield model to quantify the effects of overlay errors and cut-hole CD variations. The overhang distance designed in a stitching process (or its mean value μ) is found to be critical to the stitching yield performance and can be optimized using this yield model. We also investigate the physical significance of several process parameters such as half pitch (HP), standard deviation (σ) of the random overhang distribution, and cut-hole CD (CL). Our study shows that certain types of stitching yield are sensitive to σ and HP, while in general high yield can be achieved for a large number of stitching types we examined. To improve the yield of certain challenging stitching structures, various layout modification strategies are proposed and discussed.

Paper Details

Date Published: 18 March 2015
PDF: 14 pages
Proc. SPIE 9427, Design-Process-Technology Co-optimization for Manufacturability IX, 942714 (18 March 2015); doi: 10.1117/12.2085898
Show Author Affiliations
Jun Zhou, Peking Univ. (China)
Hongyi Liu, Peking Univ. (China)
Ting Han, Peking Univ. (China)
Yijian Chen, Peking Univ. (China)


Published in SPIE Proceedings Vol. 9427:
Design-Process-Technology Co-optimization for Manufacturability IX
John L. Sturtevant; Luigi Capodieci, Editor(s)

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