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Proceedings Paper

Advanced electric-field scanning probe lithography on molecular resist using active cantilever
Author(s): Marcus Kaestner; Cemal Aydogan; Hubert-Seweryn Lipowicz; Tzvetan Ivanov; Steve Lenk; Ahmad Ahmad; Tihomir Angelov; Alexander Reum; Valentyn Ishchuk; Ivaylo Atanasov; Yana Krivoshapkina; Manuel Hofer; Mathias Holz; Ivo W. Rangelow
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Paper Abstract

The routine “on demand” fabrication of features smaller than 10 nm opens up new possibilities for the realization of many novel nanoelectronic, NEMS, optical and bio-nanotechnology-based devices. Based on the thermally actuated, piezoresistive cantilever technology we have developed a first prototype of a scanning probe lithography (SPL) platform able to image, inspect, align and pattern features down to single digit nano regime. The direct, mask-less patterning of molecular resists using active scanning probes represents a promising path circumventing the problems in today’s radiation-based lithography. Here, we present examples of practical applications of the previously published electric field based, current-controlled scanning probe lithography on molecular glass resist calixarene by using the developed tabletop SPL system. We demonstrate the application of a step-and-repeat scanning probe lithography scheme including optical as well as AFM based alignment and navigation. In addition, sequential read-write cycle patterning combining positive and negative tone lithography is shown. We are presenting patterning over larger areas (80 x 80 μm) and feature the practical applicability of the lithographic processes.

Paper Details

Date Published: 17 March 2015
PDF: 16 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230E (17 March 2015); doi: 10.1117/12.2085846
Show Author Affiliations
Marcus Kaestner, Technische Univ. Ilmenau (Germany)
Cemal Aydogan, Technische Univ. Ilmenau (Germany)
Hubert-Seweryn Lipowicz, Technische Univ. Ilmenau (Germany)
Tzvetan Ivanov, Technische Univ. Ilmenau (Germany)
Steve Lenk, Technische Univ. Ilmenau (Germany)
Ahmad Ahmad, Technische Univ. Ilmenau (Germany)
Tihomir Angelov, Technische Univ. Ilmenau (Germany)
Alexander Reum, nano analytik GmbH (Germany)
Valentyn Ishchuk, Technische Univ. Ilmenau (Germany)
Ivaylo Atanasov, nano analytik GmbH (Germany)
Yana Krivoshapkina, Technische Univ. Ilmenau (Germany)
Manuel Hofer, nano analytik GmbH (Germany)
Mathias Holz, nano analytik GmbH (Germany)
Ivo W. Rangelow, Technische Univ. Ilmenau (Germany)

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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