Share Email Print
cover

Proceedings Paper

Creation of guiding patterns for directed self-assembly of block copolymers by resistless direct e-beam exposure
Author(s): Laura Evangelio; Marta Fernández-Regúlez; Xavier Borrisé; Matteo Lorenzoni; Jordi Fraxedas; Francesc Pérez-Murano
Format Member Price Non-Member Price
PDF $14.40 $18.00

Paper Abstract

We present a novel approach for the creation of guiding patterns to direct the self-assembly of block copolymers. A neutral layer of a brush polymer is directly exposed by electrons, causing the cross-linking of the brush molecules, and thus changing its local affinity. The advantage relies on the achievable resolution and the reduction of the process steps in comparison with deep UV and conventional electron beam lithography, since it avoids the use of a resist. We envision that this method will be highly valuable for the investigation of novel high-chi DSA materials and complex guiding pattern designs, where pattern placement and resolution is becoming critical.

Paper Details

Date Published: 27 March 2015
PDF: 7 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942326 (27 March 2015); doi: 10.1117/12.2085830
Show Author Affiliations
Laura Evangelio, Ctr. Nacional de Microelectrónica (Spain)
Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Marta Fernández-Regúlez, Ctr. Nacional de Microelectrónica (Spain)
CEA-LETI (France)
Xavier Borrisé, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Matteo Lorenzoni, Ctr. Nacional de Microelectrónica (Spain)
Jordi Fraxedas, Institut Català de Nanociència i Nanotecnologia (ICN2) (Spain)
Francesc Pérez-Murano, Ctr. Nacional de Microelectrónica (Spain)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

© SPIE. Terms of Use
Back to Top