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Proceedings Paper

Grazing-incidence small angle x-ray scattering studies of nanoscale polymer gratings
Author(s): Manolis Doxastakis; Hyo Seon Suh; Xuanxuan Chen; Paulina A. Rincon Delgadillo; Lingshu Wan; Lance Williamson; Zhang Jiang; Joseph Strzalka; Jin Wang; Wei Chen; Nicola Ferrier; Abelardo Ramirez-Hernandez; Juan J. de Pablo; Roel Gronheid; Paul Nealey
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Paper Abstract

Grazing-Incidence Small Angle X-ray Scattering (GISAXS) offers the ability to probe large sample areas, providing three-dimensional structural information at high detail in a thin film geometry. In this study we exploit the application of GISAXS to structures formed at one step of the LiNe (Liu-Nealey) flow using chemical patterns for directed self-assembly of block copolymer films. Experiments conducted at the Argonne National Laboratory provided scattering patterns probing film characteristics at both parallel and normal directions to the surface. We demonstrate the application of new computational methods to construct models based on scattering measured. Such analysis allows for extraction of structural characteristics at unprecedented detail.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94241N (19 March 2015); doi: 10.1117/12.2085824
Show Author Affiliations
Manolis Doxastakis, Argonne National Lab. (United States)
Hyo Seon Suh, Argonne National Lab. (United States)
The Univ. of Chicago (United States)
Xuanxuan Chen, The Univ. of Chicago (United States)
Paulina A. Rincon Delgadillo, The Univ. of Chicago (United States)
IMEC (Belgium)
KU Leuven (Belgium)
Lingshu Wan, The Univ. of Chicago (United States)
Lance Williamson, The Univ. of Chicago (United States)
Zhang Jiang, Argonne National Lab. (United States)
Joseph Strzalka, Argonne National Lab. (United States)
Jin Wang, Argonne National Lab. (United States)
Wei Chen, Argonne National Lab. (United States)
Nicola Ferrier, Argonne National Lab. (United States)
Abelardo Ramirez-Hernandez, Argonne National Lab. (United States)
Juan J. de Pablo, Argonne National Lab. (United States)
The Univ. of Chicago (United States)
Roel Gronheid, IMEC (Belgium)
Paul Nealey, Argonne National Lab. (United States)
The Univ. of Chicago (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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