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Proceedings Paper

193i lithography for contact doubling with grapho-epitaxy DSA: a simulation study
Author(s): A. Fouquet; L. Perraud; S. Bérard-Bergery; A. Gharbi; P. Pimenta-Barros; R. Tiron; J. Hazart; V. Farys
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Paper Abstract

Directed self-assembly (DSA) of block copolymers (BCP) is a promising candidate for alternative micro lithography due to its cost effectiveness, its ability to reduce critical dimension and to increase pattern density. For contact layer patterning, grapho-epitaxy combined with cylindrical BCP is a good candidate. While contact shrink has already been a well-controlled process, contact multiplication is still undergoing further studies. In this paper we propose to study the impact of 193i scanner variations on BCP overlay for contact doubling.

Paper Details

Date Published: 27 March 2015
PDF: 9 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942324 (27 March 2015); doi: 10.1117/12.2085822
Show Author Affiliations
A. Fouquet, CEA-LETI (France)
L. Perraud, CEA-LETI (France)
S. Bérard-Bergery, CEA-LETI (France)
A. Gharbi, CEA-LETI (France)
P. Pimenta-Barros, CEA-LETI (France)
R. Tiron, CEA-LETI (France)
J. Hazart, CEA-LETI (France)
V. Farys, STMicroelectronics (France)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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