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Proceedings Paper

Hp-finite element method for simulating light scattering from complex 3D structures
Author(s): Sven Burger; Lin Zschiedrich; Jan Pomplun; Sven Herrmann; Frank Schmidt
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Paper Abstract

Methods for solving Maxwell’s equations are integral part of optical metrology and computational lithography setups. Applications require accurate geometrical resolution, high numerical accuracy and/or low computation times. We present a finite-element based electromagnetic field solver relying on unstructured 3D meshes and adaptive hp-refinement. We apply the method for simulating light scattering off arrays of high aspect-ratio nano-posts and FinFETs.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240Z (19 March 2015); doi: 10.1117/12.2085795
Show Author Affiliations
Sven Burger, JCMwave GmbH (Germany)
Zuse Institute Berlin (Germany)
Lin Zschiedrich, JCMwave GmbH (Germany)
Jan Pomplun, JCMwave GmbH (Germany)
Sven Herrmann, Zuse Institute Berlin (Germany)
Frank Schmidt, JCMwave GmbH (Germany)
Zuse Institute Berlin (Germany)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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