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Proceedings Paper

Aromatizing unzipping polyester for EUV photoresist
Author(s): Kensuke Matsuzawa; Ryan Mesch; Mike Olah; Wade Wang; Scott T. Phillips; C. Grant Willson
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Paper Abstract

New “self-immolating” or “unzipping” polymers, materials that depolymerize in response to irradiation, were designed and prepared successfully. We studied several candidate polymers and ultimately chose two of them for further development. One is a polyester that aromatizes upon depolymerization. The unzipping reaction initiated by UV exposure in solution was confirmed. The polymer was then studied in thin films to assess its potential for use in formulating photoresists. The neat polymer was tested as a blend with novolac resin. The effect of unzipping polyester loading in novolac on the rate of dissolution of films in TMAH was studied. Inhibition occurs at 20−30% loading. The films were exposed with DUV light and patterning was observed. The sensitivity of the unzipping polyester formulation is low in part due to the low absorption of the polymer for UV light. However, the polymer showed higher sensitivity with EUV exposure and first contrast curves show sensitivity in the range of 20−25mJ/cm2.

Paper Details

Date Published: 20 March 2015
PDF: 8 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251Q (20 March 2015); doi: 10.1117/12.2085780
Show Author Affiliations
Kensuke Matsuzawa, The Univ. of Texas at Austin (United States)
Toyko Ohka Kogyo Co., Ltd. (Japan)
Ryan Mesch, The Univ. of Texas at Austin (United States)
Mike Olah, The Pennsylvania State Univ. (United States)
Wade Wang, The Univ. of Texas at Austin (United States)
Scott T. Phillips, The Pennsylvania State Univ. (United States)
C. Grant Willson, The Univ. of Texas at Austin (United States)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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