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Proceedings Paper

Inverse lithography using sparse mask representations
Author(s): Radu C. Ionescu; Paul Hurley; Stefan Apostol
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Paper Abstract

We present a novel optimisation algorithm for inverse lithography, based on optimization of the mask derivative, a domain inherently sparse, and for rectilinear polygons, invertible. The method is first developed assuming a point light source, and then extended to general incoherent sources. What results is a fast algorithm, producing manufacturable masks (the search space is constrained to rectilinear polygons), and flexible (specific constraints such as minimal line widths can be imposed). One inherent trick is to treat polygons as continuous entities, thus making aerial image calculation extremely fast and accurate. Requirements for mask manufacturability can be integrated in the optimization without too much added complexity. We also explain how to extend the scheme for phase-changing mask optimization.

Paper Details

Date Published: 18 March 2015
PDF: 14 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 94260K (18 March 2015); doi: 10.1117/12.2085762
Show Author Affiliations
Radu C. Ionescu, IBM Research - Zürich (Switzerland)
École Polytechnique Fédérale de Lausanne (Switzerland)
Paul Hurley, IBM Research - Zürich (Switzerland)
Stefan Apostol, IBM Research - Zürich (Switzerland)

Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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