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Proceedings Paper

Development of NIL processes for PV applications
Author(s): H. Hauser; N. Tucher; K. Tokai; P. Schneider; Ch. Wellens; A. Volk; S. Barke; C. Müller; Thomas Glinsner; B. Bläsi
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Paper Abstract

Due to its high resolution and applicability for large area patterning, Nanoimprint Lithography (NIL) is a promising technology for photovoltaic (PV) applications. However, a successful industrial application of NIL processes is only possible if large-area processing on thin, brittle and potentially rough substrates can be achieved in a high-throughput process. In this work, the development of NIL processes using the novel SmartNILTM technology from EV Group with a focus on PV applications is described. We applied this tooling to realize a honeycomb texture (8 μm period) on the front side of multicrystalline silicon solar cells leading to an improvement in optical efficiency of 7% relative and a total efficiency gain of 0.5% absolute compared to the industrial standard texture (isotexture). On the rear side of monocrystalline silicon solar cells, we realized diffraction gratings to make use of light trapping effects. An absorption enhancement of up to 35% absolute at a wavelength of 1100 nm is demonstrated. Furthermore, we combined photolithography and NIL processes to introduce features for metal contacts into honeycomb master structures, which initially were realized using interference lithography. As final application, we investigated the realization of very fine contact fingers with prismatic shape in order to minimize reflection losses.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230U (19 March 2015); doi: 10.1117/12.2085754
Show Author Affiliations
H. Hauser, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
N. Tucher, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
K. Tokai, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
P. Schneider, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
Ch. Wellens, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
A. Volk, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
S. Barke, Fraunhofer Institute for Solar Energy Systems ISE (Germany)
C. Müller, Albert-Ludwigs-Univ. (Germany)
Thomas Glinsner, EV Group (Austria)
B. Bläsi, Fraunhofer Institute for Solar Energy Systems ISE (Germany)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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