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Proceedings Paper

Mapping self-assembled dots and line arrays by image analysis for quantification of defect density and alignment
Author(s): C. Simão; D. Tuchapsky; W. Khunsin; A. Amann; M. A. Morris; C. M. Sotomayor Torres
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Paper Abstract

Bottom-up alternative lithographic masks from directed self-assembly systems have been extending the limits of critical dimensions in a cost-effective manner although great challenges in controlling defectivity remain open. Particularly, defectivity and dimensional metrology are two main challenges in lithography due to the increasing miniaturisation of circuits. To gain insights about the percentage of alignment, defectivity and order quantification, directed self-assembly block copolymer fingerprints were investigated via an image analysis methodology. Here we present the analysis of hexagonal phase of polystyrene-b-polydimethylsiloxane (PS-b-PDMS) forming linear patterns in topological substrates. From our methodology, we have performed dimensional metrology estimating pitch size and error, and the linewidth of the lines was estimated. In parallel, the methodology allowed us identification and quantification of typical defects observable in self-assembly, such as turning points, disclination or branching points, break or lone points and end points. The methodology presented here yields high volume statistical data useful for advancing dimensional metrology and defect analysis of self- and directed assembly systems.

Paper Details

Date Published: 27 March 2015
PDF: 8 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 942322 (27 March 2015); doi: 10.1117/12.2085748
Show Author Affiliations
C. Simão, Institut Català de Nanociència i Nanotecnologia (Spain)
D. Tuchapsky, Univ. College Cork (Ireland)
W. Khunsin, Institut Català de Nanociència i Nanotecnologia (Spain)
A. Amann, Univ. College Cork (Ireland)
M. A. Morris, Univ. College Cork (Ireland)
Trinity College Dublin (Ireland)
C. M. Sotomayor Torres, Institut Català de Nanociència i Nanotecnologia (Spain)
Institució Catalana de Recerca i Estudis Avançats (Spain)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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