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Proceedings Paper

Latest performance of ArF immersion scanner NSR-S630D for high-volume manufacturing for 7nm node
Author(s): Takayuki Funatsu; Yusaku Uehara; Yujiro Hikida; Akira Hayakawa; Satoshi Ishiyama; Toru Hirayama; Hirotaka Kono; Yosuke Shirata; Yuichi Shibazaki
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Paper Abstract

In order to achieve stable operation in cutting-edge semiconductor manufacturing, Nikon has developed NSR-S630D with extremely accurate overlay while maintaining throughput in various conditions resembling a real production environment. In addition, NSR-S630D has been equipped with enhanced capabilities to maintain long-term overlay stability and user interface improvement all due to our newly developed application software platform. In this paper, we describe the most recent S630D performance in various conditions similar to real productions. In a production environment, superior overlay accuracy with high dose conditions and high throughput are often required; therefore, we have performed several experiments with high dose conditions to demonstrate NSR’s thermal aberration capabilities in order to achieve world class overlay performance. Furthermore, we will introduce our new software that enables long term overlay performance.

Paper Details

Date Published: 18 March 2015
PDF: 13 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942617 (18 March 2015); doi: 10.1117/12.2085735
Show Author Affiliations
Takayuki Funatsu, Nikon Corp. (Japan)
Yusaku Uehara, Nikon Corp. (Japan)
Yujiro Hikida, Nikon Corp. (Japan)
Akira Hayakawa, Nikon Corp. (Japan)
Satoshi Ishiyama, Nikon Corp. (Japan)
Toru Hirayama, Nikon Corp. (Japan)
Hirotaka Kono, Nikon Corp. (Japan)
Yosuke Shirata, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)

Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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