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Proceedings Paper

Sub-5nm patterning using helium ion-beam lithography and nanoimprint lithography
Author(s): Yuhan Yao; He Liu; Yifei Wang; Wen-Di Li; Ahmad N. Abbas; Gang Liu; R. Stanley Williams; Chongwu Zhou; Wei Wu
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Paper Details

Date Published:
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Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94230J; doi: 10.1117/12.2085725
Show Author Affiliations
Yuhan Yao, The Univ. of Southern California (United States)
He Liu, The Univ. of Southern California (United States)
Yifei Wang, The Univ. of Southern California (United States)
Wen-Di Li, The Univ. of Hong Kong (China)
Ahmad N. Abbas, The Univ. of Southern California (United States)
Gang Liu, The Univ. of Southern California (United States)
R. Stanley Williams, Hewlett-Packard Labs. (United States)
Chongwu Zhou, The Univ. of Southern California (United States)
Wei Wu, The Univ. of Southern California (United States)


Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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