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Proceedings Paper

Novel thin film analysis to investigate actual film formation
Author(s): Kazunori Sakai; Kenji Mochida; Shinichi Nakamura; Tooru Kimura; Kazuhiro Yoshikawa; Naoki Man; Hirofumi Seiki; Masaaki Takeda
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Paper Abstract

In order to understand the mechanism of the pattern wiggling distortion and to find control knobs for improving wiggle performance of spin-on carbon hard mask materials, we have developed analysis method of underlayer (UL) films by utilizing XPS depth profiling using Gas Cluster Ion Beam(GCIB-XPS). Differences of distributions of elemental compositions from the surface to the bottom of the processed or un-processed films have been visualized by GCIB-XPS analysis. Besides, these achievements allow us to identify fluoro substitution of oxygen during etching process as the control knob for the pattern wiggling distortion.

Paper Details

Date Published: 20 March 2015
PDF: 9 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942522 (20 March 2015); doi: 10.1117/12.2085717
Show Author Affiliations
Kazunori Sakai, JSR Corp. (Japan)
Kenji Mochida, JSR Corp. (Japan)
Shinichi Nakamura, JSR Corp. (Japan)
Tooru Kimura, JSR Corp. (Japan)
Kazuhiro Yoshikawa, Toray Research Ctr., Inc. (Japan)
Naoki Man, Toray Research Ctr., Inc. (Japan)
Hirofumi Seiki, Toray Research Ctr., Inc. (Japan)
Masaaki Takeda, Toray Research Ctr., Inc. (Japan)

Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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