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Proceedings Paper

New approach to improve LER of EUV resist pattern by chemical and thermal treatment
Author(s): Tatsuro Nagahara; Kazuma Yamamoto; Yuriko Matsuura; Takashi Sekito
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Paper Abstract

In this paper, we discuss a new approach to improve the resist roughness, which is applied after the lithography process. The ERC (Edge Roughness Controller) process is composed of two steps, 1) To deliver resist softening material at the resist surface 2) To give thermal flow at that region in the bake step. Several samples were prepared based on this concept and consistent improvement was observed. Finally, by optimizing ERC chemistry using HSP (Hansen Solubility Parameter), LWR improvement of 14.8% could be achieved.

Paper Details

Date Published: 13 March 2015
PDF: 7 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94222F (13 March 2015); doi: 10.1117/12.2085713
Show Author Affiliations
Tatsuro Nagahara, Merck Performance Materials Manufacturing G.K. (Japan)
Kazuma Yamamoto, Merck Performance Materials Manufacturing G.K. (Japan)
Yuriko Matsuura, Merck Performance Materials Manufacturing G.K. (Japan)
Takashi Sekito, Merck Performance Materials Manufacturing G.K. (Japan)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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