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Proceedings Paper

Microbridge reduction in negative-tone imaging at photoresist point-of-use filtration
Author(s): Toru Umeda; Tsukasa Yamanaka; Naoya Iguchi; Shuichi Tsuzuki
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Paper Abstract

It is well known that point-of-use (POU) filtration is an effective means of reducing microbridging defects in lithographic processes involving photoresists. To date, most of the optimization studies have been targeted toward understanding the microbridging defects in positive tone imaging (PTI) process. Considering that negative tone imaging (NTI) process has recently been introduced in advanced technology nodes, we focused our POU filtration studies on understanding the factors that modulate microbridging in NTI and PTI processes. Our studies pointed out that Nylon 6,6 membrane is distinctly more effective in reducing microbridging defects in NTI resists, whereas HDPE membranes show significant improvement in PTI resists. These results were rationalized based on the polarity differences of microbridges in PTI and NTI processes.

Paper Details

Date Published: 20 March 2015
PDF: 11 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942521 (20 March 2015); doi: 10.1117/12.2085710
Show Author Affiliations
Toru Umeda, Nihon Pall Ltd. (Japan)
Tsukasa Yamanaka, FUJIFILM Corp. (Japan)
Naoya Iguchi, FUJIFILM Corp. (Japan)
Shuichi Tsuzuki, Nihon Pall Ltd. (Japan)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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