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Proceedings Paper

Recent progress of negative-tone imaging with EUV exposure
Author(s): Toru Fujimori; Toru Tsuchihashi; Toshiro Itani
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Paper Abstract

This study describes the recent progress of negative-tone imaging with EUV exposure (EUV-NTI) compared with positive-tone development (PTD). NTI uses organic solvent-based developer to provide low swelling and smooth-dissolving behavior. Therefore, EUV-NTI is expected to offer several advantages in terms of performance, especially for improving line-width roughness (LWR), which is expected to resolve the resolution, LWR, and sensitivity (RLS) tradeoff. Herein, novel chemical amplified resist materials for EUV-NTI are investigated to improve LWR and sensitivity. Results indicate that the EUV-NTI has better performance than PTD, with ‘single digit mJ/cm2,while maintaining the LWR performance. Furthermore, EUV-NTI processing such as the pre-applied bake (PAB) temperature, post-exposure bake (PEB) temperature, development procedure, and rinse procedure are very effective for improving the lithographic performance. In addition, the lithographic performance with NXE3100 scanner is also reported.

Paper Details

Date Published: 20 March 2015
PDF: 6 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 942505 (20 March 2015); doi: 10.1117/12.2085706
Show Author Affiliations
Toru Fujimori, EUVL Infrastructure Development Ctr., Inc. (Japan)
Toru Tsuchihashi, EUVL Infrastructure Development Ctr., Inc. (Japan)
Toshiro Itani, EUVL Infrastructure Development Ctr., Inc. (Japan)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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