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Proceedings Paper

Total lithography system based on a new application software platform enabling smart scanner management
Author(s): Hirotaka Kono; Kazuo Masaki; Tomoyuki Matsuyama; Shinji Wakamoto; Seemoon Park; Taro Sugihara; Yuichi Shibazaki
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Paper Abstract

Along with device shrinkage, higher accuracy will continuously be required from photo-lithography tools in order to enhance on-product yield. In order to achieve higher yield, the advanced photo-lithography tools must be equipped with sophisticated tuning knobs on the tool and with software that is flexible enough to be applied per layer. This means photo-lithography tools must be capable of handling many types of sub-recipes and parameters simultaneously.

To enable managing such a large amount of data easily and to setup lithography tools smoothly, we have developed a total lithography system called Litho Turnkey Solution based on a new software application platform, which we call Plug and Play Manager (PPM). PPM has its own graphical user interface, which enables total management of various data. Here various data means recipes, sub-recipes, tuning-parameters, measurement results, and so on. Through PPM, parameter making by intelligent applications such as CDU/Overlay tuning tools can easily be implemented. In addition, PPM is also linked to metrology tools and the customer’s host computer, which enables data flow automation. Based on measurement data received from the metrology tools, PPM calculates correction parameters and sends them to the scanners automatically. This scheme can make calibration feedback loops possible. It should be noted that the abovementioned functions are running on the same platform through a user-friendly interface. This leads to smart scanner management and usability improvement.

In this paper, we will demonstrate the latest development status of Nikon’s total lithography solution based on PPM; describe details of each application; and provide supporting data for the accuracy and usability of the system. Keywords: exposure

Paper Details

Date Published: 18 March 2015
PDF: 12 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 942619 (18 March 2015); doi: 10.1117/12.2085689
Show Author Affiliations
Hirotaka Kono, Nikon Corp. (Japan)
Kazuo Masaki, Nikon Corp. (Japan)
Tomoyuki Matsuyama, Nikon Corp. (Japan)
Shinji Wakamoto, Nikon Precision Inc. (United States)
Seemoon Park, Nikon Corp. (Japan)
Taro Sugihara, Nikon Corp. (Japan)
Yuichi Shibazaki, Nikon Corp. (Japan)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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