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Proceedings Paper

Barriers to defect melting in chemo-epitaxial directed self-assembly of lamellar-forming diblock copolymer/homopolymer blends
Author(s): Kenichi Izumi; Bongkeun Kim; Nabil Laachi; Kris T. Delaney; Michael Carilli; Glenn H. Fredrickson
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Paper Abstract

We investigate energy barriers and minimum energy paths (MEPs) for transitions from dislocation-pair defects to perfect lamellae in self-assembly of AB-diblock copolymer plus A- or B-homopolymer blends using self-consistent field theory (SCFT) and the numerical string method. For neutral substrates, all minimum energy paths discovered by the string method show two successive energy barriers. The two-barrier qualitative nature of the MEPs appears not to depend on the presence or absence of small amounts of homopolymer. For the first energy barrier, the barrier height shows pronounced increase with addition of A-homopolymer due to localization of A-homopolymer on the T-junction core of the dislocation. For chemo-epitaxially patterned substrates (stripes of A-attractive substrate alternating with neutral substrate), the presence of A-attractive stripes helps draw the system towards a perfect lamellar configuration, and energy barriers along the MEP are reduced, in some cases disappearing entirely. Our findings provide guidance on how the presence of homopolymer and chemo-epitaxial prepatterns affect the stability of defective morphologies.

Paper Details

Date Published: 27 March 2015
PDF: 10 pages
Proc. SPIE 9423, Alternative Lithographic Technologies VII, 94232C (27 March 2015); doi: 10.1117/12.2085685
Show Author Affiliations
Kenichi Izumi, Univ. of California, Santa Barbara (United States)
JSR Corp. (Japan)
Bongkeun Kim, Univ. of California, Santa Barbara (United States)
Nabil Laachi, Univ. of California, Santa Barbara (United States)
Kris T. Delaney, Univ. of California, Santa Barbara (United States)
Michael Carilli, Univ. of California, Santa Barbara (United States)
Glenn H. Fredrickson, Univ. of California, Santa Barbara (United States)

Published in SPIE Proceedings Vol. 9423:
Alternative Lithographic Technologies VII
Douglas J. Resnick; Christopher Bencher, Editor(s)

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