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Proceedings Paper

120W ArF laser with high-wavelength stability and efficiency for the next-generation multiple-patterning immersion lithography
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Paper Abstract

The new ArF Immersion Laser, GT64A has been developed to support the next generation multiple-patterning process. It offers the industry’s highest output power of 120W with high stability and efficiency. 120W output power with auto-adjusting function enables to meet the requirements of various processes and makes higher-throughput possible even at 450mm-wafers. The increased wavelength stability and bandwidth stability can further improve overlay accuracy and CD error required for the next generation multiple-patterning lithography. Advanced gas control algorithm reduces the consumption of rare gases such as neon to a half. Helium-free operation is also under development to cope with the unstable supply of helium gases worldwide.

New advanced wavelength control and bandwidth control algorithm has been developed to meet tighter stability requirement for the next generation multiple-patterning lithography.

Paper Details

Date Published: 18 March 2015
PDF: 8 pages
Proc. SPIE 9426, Optical Microlithography XXVIII, 94261J (18 March 2015); doi: 10.1117/12.2085631
Show Author Affiliations
Takeshi Ohta, Gigaphoton Inc. (Japan)
Keisuke Ishida, Gigaphoton Inc. (Japan)
Takahito Kumazaki, Gigaphoton Inc. (Japan)
Hiroaki Tsushima, Gigaphoton Inc. (Japan)
Akihiko Kurosu, Gigaphoton Inc. (Japan)
Kouji Kakizaki, Gigaphoton Inc. (Japan)
Takashi Matsunaga, Gigaphoton Inc. (Japan)
Hakaru Mizoguchi, Gigaphoton Inc. (Japan)


Published in SPIE Proceedings Vol. 9426:
Optical Microlithography XXVIII
Kafai Lai; Andreas Erdmann, Editor(s)

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