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Proceedings Paper

Relationship between information and energy carried by extreme-ultraviolet photons: consideration from the viewpoint of sensitivity enhancement
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Paper Abstract

The role of photons in lithography is the transfer of information and energy. The resist patterns are fabricated in accordance with the information carried by photons. The energy is used to induce the chemical reactions required for the solubility change of the resist. In this study, the relationship between information and energy carried by photons was investigated. Which of the factors limits the resist performance depends on the relationship between requirement and resist performance. In the design of next generation resist materials, it is important to determine which is insufficient, information or energy.

Paper Details

Date Published: 13 March 2015
PDF: 6 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 942206 (13 March 2015); doi: 10.1117/12.2085619
Show Author Affiliations
Takahiro Kozawa, Osaka Univ. (Japan)
Shinya Fujii, Osaka Univ. (Japan)
Julius Joseph Santillan, EUVL Infrastructure Development Ctr., Inc. (Japan)
Toshiro Itani, EUVL Infrastructure Development Ctr., Inc. (Japan)

Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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