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Proceedings Paper

Mechanical and thermal properties of nanomaterials at sub-50nm dimensions characterized using coherent EUV beams
Author(s): Kathleen Hoogeboom-Pot; Jorge Hernandez-Charpak; Travis Frazer; Xiaokun Gu; Emrah Turgut; Erik Anderson; Weilun Chao; Justin Shaw; Ronggui Yang; Margaret Murnane; Henry Kapteyn; Damiano Nardi
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Paper Abstract

Coherent extreme ultraviolet beams from tabletop high harmonic generation offer several revolutionary capabilities for observing nanoscale systems on their intrinsic length and time scales. By launching and monitoring hypersonic acoustic waves in such systems, we characterize the mechanical properties of sub-10nm layers and find that the material densities remain close to their bulk values while their elastic properties are significantly modified. Moreover, within the same measurement, by following the heat dissipation dynamics from 30-750nm-wide nanowires, we uncover a new thermal transport regime in which closely-spaced nanoscale heat sources can surprisingly cool more efficiently than widelyspaced heat sources of the same size.

Paper Details

Date Published: 19 March 2015
PDF: 8 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942417 (19 March 2015); doi: 10.1117/12.2085615
Show Author Affiliations
Kathleen Hoogeboom-Pot, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Jorge Hernandez-Charpak, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Travis Frazer, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Xiaokun Gu, Univ. of Colorado at Boulder (United States)
Emrah Turgut, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Erik Anderson, Lawrence Berkeley National Lab. (United States)
Weilun Chao, Lawrence Berkeley National Lab. (United States)
Justin Shaw, National Institute of Standards and Technology (United States)
Ronggui Yang, Univ. of Colorado at Boulder (United States)
Margaret Murnane, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Henry Kapteyn, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)
Damiano Nardi, JILA, Univ. of Colorado at Boulder (United States)
National Institute of Standards and Technology (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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