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Proceedings Paper

Metrology of DSA process using TEM tomography
Author(s): Tamar Segal-Peretz; Jonathan Winterstein; Jiaxing Ren; Mahua Biswas; J. Alexander Liddle; Jeffery W. Elam; Leonidas E. Ocola; Ralu N. S. Divan; Nestor Zaluzec; Paul F. Nealey
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Paper Abstract

Directed self-assembly (DSA) of block copolymers (BCPs) is a rising technique for sub-20 nm patterning. To fully harness DSA capabilities for patterning, a detailed understanding of the three dimensional (3D) structure of BCPs is needed. By combining sequential infiltration synthesis (SIS) and scanning transmission electron microscopy (STEM) tomography, we have characterized the 3D structure of self-assembled and DSA BCPs films with high precision and resolution. SIS is an emerging technique for enhancing pattern transfer in BCPs through the selective growth of inorganic material in polar BCP domains. Here, Al2O3 SIS was used to enhance the imaging contrast and enable tomographic characterization of BCPs with high fidelity. Moreover, by utilizing SIS for both 3D characterization and hard mask fabrication, we were able to characterize the BCP morphology as well as the alumina nanostructures that would be used for pattern transfer.

Paper Details

Date Published: 19 March 2015
PDF: 6 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94240U (19 March 2015); doi: 10.1117/12.2085577
Show Author Affiliations
Tamar Segal-Peretz, The Univ. of Chicago (United States)
Argonne National Lab. (United States)
Jonathan Winterstein, National Institute of Standards and Technology (United States)
Jiaxing Ren, The Univ. of Chicago (United States)
Mahua Biswas, Argonne National Lab. (United States)
J. Alexander Liddle, National Institute of Standards and Technology (United States)
Jeffery W. Elam, Argonne National Lab. (United States)
Leonidas E. Ocola, Argonne National Lab. (United States)
Ralu N. S. Divan, Argonne National Lab. (United States)
Nestor Zaluzec, Argonne National Lab. (United States)
Paul F. Nealey, The Univ. of Chicago (United States)
Argonne National Lab. (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

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