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Proceedings Paper

Development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL
Author(s): Takumi Toida; Akihiro Suzuki; Naoya Uchiyama; Takashi Makinoshima; Masaaki Takasuka; Takashi Sato; Masatoshi Echigo
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Paper Abstract

In this paper, we report the development of new xanthendiol derivatives applied to the negative-tone molecular resists for EB/EUVL. The new xanthendiol derivatives were easily synthesized by the condensation of aldehydes and dihydroxyaromatic compounds. We found 13,13’-biphenyl-bis(13H-benzoxanthen-2,11-diol) was showed the good applicability to the raw material for the resist for EB/EUVL. The EB patterning result showed the resist containing xanthendiol derivative could resolve the 20 nm half-pitch pattern, and 15 nm half-pitch patterns were partially resolved.

Paper Details

Date Published: 20 March 2015
PDF: 8 pages
Proc. SPIE 9425, Advances in Patterning Materials and Processes XXXII, 94251L (20 March 2015); doi: 10.1117/12.2085470
Show Author Affiliations
Takumi Toida, Mitsubishi Gas Chemical Co., Inc. (Japan)
Akihiro Suzuki, Mitsubishi Gas Chemical Co., Inc. (Japan)
Naoya Uchiyama, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Makinoshima, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masaaki Takasuka, Mitsubishi Gas Chemical Co., Inc. (Japan)
Takashi Sato, Mitsubishi Gas Chemical Co., Inc. (Japan)
Masatoshi Echigo, Mitsubishi Gas Chemical Co., Inc. (Japan)


Published in SPIE Proceedings Vol. 9425:
Advances in Patterning Materials and Processes XXXII
Thomas I. Wallow; Christoph K. Hohle, Editor(s)

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