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Proceedings Paper

An accurate method to determine the amount of out-of-band light in an EUV scanner
Author(s): Shinn-Sheng Yu; Yen-Cheng Lu; Chih-Tsung Shih; Chia-Chun Chung; Shang-Chieh Chien; Shun-Der Wu; Norman Chen; Shu-Hao Chang; Hsiang-Yu Chou; Jui-Ching Wu; Tao-Ming Huang; Jack J. H. Chen; Anthony Yen
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Paper Abstract

In this paper, we proposed a new design of the test mask to measure the amount of the out-of-band (OOB) light from an extreme-ultraviolet (EUV) light source by detuning the period of the multilayer (ML), rather than changing the material of the absorber, to suppress reflection of EUV light. The new OOB test mask also reflects essentially the same OOB light as that of the production mask at each wavelength in the whole OOB spectral range. With the help of the new OOB test mask, the contributions to the background intensity from in-band flare and OOB light can be correctly separated and an accurate optical-proximity-correction (OPC) model can be established.

Paper Details

Date Published: 19 March 2015
PDF: 7 pages
Proc. SPIE 9422, Extreme Ultraviolet (EUV) Lithography VI, 94221T (19 March 2015); doi: 10.1117/12.2085089
Show Author Affiliations
Shinn-Sheng Yu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Yen-Cheng Lu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Chih-Tsung Shih, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Chia-Chun Chung, Taiwan Semiconductor Manufacturing Co Ltd (Taiwan)
Shang-Chieh Chien, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Shun-Der Wu, Taiwan Semiconductor Manufacturing Co Ltd (Taiwan)
Norman Chen, Taiwan Semiconductor Manufacturing Co Ltd (Taiwan)
Shu-Hao Chang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Hsiang-Yu Chou, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Jui-Ching Wu, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Tao-Ming Huang, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Jack J. H. Chen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)
Anthony Yen, Taiwan Semiconductor Manufacturing Co. Ltd. (Taiwan)


Published in SPIE Proceedings Vol. 9422:
Extreme Ultraviolet (EUV) Lithography VI
Obert R. Wood; Eric M. Panning, Editor(s)

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