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Proceedings Paper

Deep ultra-violet beam profile measurement of KrF laser using laser induced fluorescence
Author(s): Caihong Ma; Zhixing Gao
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Paper Abstract

Abstract: An instrument was built to measure the output fluorescence response characteristics of a 248nm KrF laser using 4mm-thick fluorescent glass as a screen. Experiments show when irradiated laser intensity is no more than 0.7J/cm2, the fluorescent response is linear. And the fluorescent spot intensity distribution was spatial coherent with the output beam profile distribution of the LPX-150. So we can use high-homogeneity optical glasses as fluorescence wavelength conversion material in beam profile measurements.

Paper Details

Date Published: 19 February 2015
PDF: 5 pages
Proc. SPIE 9449, The International Conference on Photonics and Optical Engineering (icPOE 2014), 944911 (19 February 2015); doi: 10.1117/12.2085055
Show Author Affiliations
Caihong Ma, Engineering Univ. of CAPF (China)
Zhixing Gao, China Institute of Atomic Energy (China)


Published in SPIE Proceedings Vol. 9449:
The International Conference on Photonics and Optical Engineering (icPOE 2014)
Ailing Tian; Anand Asundi; Weiguo Liu; Chunmin Zhang, Editor(s)

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