Share Email Print
cover

Proceedings Paper

Scanner focus metrology for advanced node scanner monitoring and control
Author(s): Jimyung Kim; Youngsik Park; Taehwa Jeong; Suhyun Kim; Kwang-Sub Yoon; Byoung-il Choi; Vladimir Levinski; Daniel Kandel; Yoel Feler; Nadav Gutman; Eltsafon Island-Ashwal; Moshe Cooper; DongSub Choi; Eitan Herzel; Tien David; JungWook Kim
Format Member Price Non-Member Price
PDF $14.40 $18.00
cover GOOD NEWS! Your organization subscribes to the SPIE Digital Library. You may be able to download this paper for free. Check Access

Paper Abstract

Scanner Focus window of the lithographic process becomes much smaller due to the shrink of the device node and multipatterning approach. Consequently, the required performance of scanner focus becomes tighter and more complicated. Focus control/monitoring methods such as “field-by-field focus control” or “intra-field focus control” is a necessity. Moreover, tight scanner focus performance requirement starts to raise another fundamental question: accuracy of the reported scanner focus.

The insufficient accuracy of the reported scanner focus using the existing methods originates from:

a) Focus measurement quality, which is due to low sensitivity of measured targets, especially around the nominal production focus.

b) The scanner focus is estimated using special targets, e.g. large pitch target and not using the device-like structures (irremovable aberration impact).

Both of these factors are eliminated using KLA-Tencor proprietary “Focus Offset” technology.

Paper Details

Date Published: 19 March 2015
PDF: 12 pages
Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 94242E (19 March 2015); doi: 10.1117/12.2084671
Show Author Affiliations
Jimyung Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Youngsik Park, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Taehwa Jeong, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Suhyun Kim, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Kwang-Sub Yoon, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Byoung-il Choi, SAMSUNG Electronics Co., Ltd. (Korea, Republic of)
Vladimir Levinski, KLA-Tencor Israel (Israel)
Daniel Kandel, KLA-Tencor Israel (Israel)
Yoel Feler, KLA-Tencor Israel (Israel)
Nadav Gutman, KLA-Tencor Israel (Israel)
Eltsafon Island-Ashwal, KLA-Tencor Israel (Israel)
Moshe Cooper, KLA-Tencor Israel (Israel)
DongSub Choi, KLA-Tencor Korea (Korea, Republic of)
Eitan Herzel, KLA-Tencor Israel (Israel)
Tien David, KLA-Tencor Korea (Korea, Republic of)
JungWook Kim, KLA-Tencor Corp. (United States)


Published in SPIE Proceedings Vol. 9424:
Metrology, Inspection, and Process Control for Microlithography XXIX
Jason P. Cain; Martha I. Sanchez, Editor(s)

© SPIE. Terms of Use
Back to Top