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Proceedings Paper

GaAsPN-based PIN solar cells MBE-grown on GaP substrates: toward the III-V/Si tandem solar cell
Author(s): M. Da Silva; S. Almosni; C. Cornet; A. Létoublon; C. Levallois; P. Rale; L. Lombez; J.-F. Guillemoles; O. Durand
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Paper Abstract

GaAsPN semiconductors are promising material for the elaboration of high efficiencies tandem solar cells on silicon substrates. GaAsPN diluted nitride alloy is studied as the top junction material due to its perfect lattice matching with the Si substrate and its ideal bandgap energy allowing a perfect current matching with the Si bottom cell. We review our recent progress in materials development of the GaAsPN alloy and our recent studies of some of the different building blocks toward the elaboration of a PIN solar cell. A lattice matched (with a GaP(001) substrate, as a first step toward the elaboration on a Si substrate) 1μm-thick GaAsPN alloy has been grown by MBE. After a post-growth annealing step, this alloy displays a strong absorption around 1.8-1.9 eV, and efficient photoluminescence at room temperature suitable for the elaboration of the targeted solar cell top junction. Early stage GaAsPN PIN solar cells prototypes have been grown on GaP (001) substrates, with 2 different absorber thicknesses (1μm and 0.3μm). The external quantum efficiencies and the I-V curves show that carriers have been extracted from the GaAsPN alloy absorbers, with an open-circuit voltage of 1.18 V, while displaying low short circuit currents meaning that the GaAsPN structural properties needs a further optimization. A better carrier extraction has been observed with the absorber displaying the smallest thickness, which is coherent with a low carriers diffusion length in our GaAsPN compound. Considering all the pathways for improvement, the efficiency obtained under AM1.5G is however promising.

Paper Details

Date Published: 16 April 2015
PDF: 10 pages
Proc. SPIE 9358, Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IV, 93580H (16 April 2015); doi: 10.1117/12.2081376
Show Author Affiliations
M. Da Silva, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)
S. Almosni, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)
C. Cornet, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)
A. Létoublon, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)
C. Levallois, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)
P. Rale, Institut de Recherche et Développement sur l'Energie Photovoltaïque, CNRS-EDF-ENSCP (France)
L. Lombez, Institut de Recherche et Développement sur l'Energie Photovoltaïque, CNRS-EDF-ENSCP (France)
J.-F. Guillemoles, Institut de Recherche et Développement sur l'Energie Photovoltaïque, CNRS-EDF-ENSCP (France)
O. Durand, Univ. Européenne de Bretagne, INSA, FOTON-OHM, CNRS (France)


Published in SPIE Proceedings Vol. 9358:
Physics, Simulation, and Photonic Engineering of Photovoltaic Devices IV
Alexandre Freundlich; Jean-François Guillemoles; Masakazu Sugiyama, Editor(s)

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