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Proceedings Paper

In-situ nanostructure fabrication using finely focused ion beams
Author(s): Lloyd R. Harriott
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Paper Abstract

Nanostructure fabrication for optoelectronic and quantum-effect devices can benefit from the greatly improved surface layer quality and low contamination offered by all vacuum processing. Finely focused ion beams can be used in a variety of ways for vacuum-compatable patterning on a nanometer size scale offering the potential of patterned devices with clean epitaxial interfaces and low dimensional confinement Several of these ion beam patterning techniques will be reviewed.

Paper Details

Date Published: 1 October 1990
PDF: 10 pages
Proc. SPIE 1284, Nanostructure and Microstructure Correlation with Physical Properties of Semiconductors, (1 October 1990); doi: 10.1117/12.20782
Show Author Affiliations
Lloyd R. Harriott, AT&T Bell Labs. (United States)


Published in SPIE Proceedings Vol. 1284:
Nanostructure and Microstructure Correlation with Physical Properties of Semiconductors
Harold G. Craighead; J. Murray Gibson, Editor(s)

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