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Proceedings Paper

Fabrication and characterization of micro-structures created by direct laser writing in multi-layered chalcogenide glasses
Author(s): Casey M. Schwarz; Chris N. Grabill; Benn Gleason; Gerald D. Richardson; Anna M. Lewis; Aadit Vyas; Clara Rivero-Baleine; Kathleen A. Richardson; Alexej Pogrebnyakov; Theresa S. Mayer; Stephen M. Kuebler
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Paper Abstract

Arsenic trisulfide (As2S3) is a chalcogenide (ChG) material with excellent infrared (IR) transparency (620 nm to 11 μm), low phonon energies, and large nonlinear refractive indices. These properties directly relate to commercial and industrial applications including sensors, photonic waveguides, and acousto-optics. Multi-photon exposure can be used to photopattern thermally deposited As2S3 ChG glassy films of molecular clusters. Immersing the photo-patterned cross-linked material into a polar-solvent removes the unexposed material leaving behind a structure that is a negative-tone replica of the photo-pattern. Nano-structure arrays that were photo-patterned in single-layered As2S3 films through multi-photon direct laser writing (DLW) resulted in the production of nano-beads as a consequence of a standing wave effect. To overcome this effect, an anti-reflective (AR) layer of arsenic triselenide (As2Se3) was thermally deposited between the silicon substrate and the As2S3 layer, creating a multi-layered film. The chemical composition of the unexposed and photo-exposed multi-layered film was examined through Raman spectroscopy. Nano-structure arrays were photopatterned in the multi-layered film and the resulting structure, morphology, and chemical composition were characterized, compared to results from the single-layered film, and correlated with the conditions of the thermal deposition, patterned irradiation, and etch processing.

Paper Details

Date Published: 13 March 2015
PDF: 9 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937403 (13 March 2015); doi: 10.1117/12.2077629
Show Author Affiliations
Casey M. Schwarz, Univ. of Central Florida (United States)
Chris N. Grabill, Univ. of Central Florida (United States)
Benn Gleason, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Clemson Univ. (United States)
Gerald D. Richardson, Univ. of Central Florida (United States)
Anna M. Lewis, Univ. of Central Florida (United States)
Aadit Vyas, Univ. of Central Florida (United States)
Clara Rivero-Baleine, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Lockheed Martin Missiles and Fire Control (United States)
Kathleen A. Richardson, CREOL, The College of Optics and Photonics, Univ. of Central Florida (United States)
Alexej Pogrebnyakov, The Pennsylvania State Univ. (United States)
Theresa S. Mayer, The Pennsylvania State Univ. (United States)
Stephen M. Kuebler, The College of Optics and Photonics, Univ. of Central Florida (United States)


Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)

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