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Proceedings Paper

Improved performance of a silicon arrayed waveguide grating by reduction of higher order mode generation near the boundary of a star coupler
Author(s): Jaegyu Park; Jiho Joo; Hyundai Park; Myung-Joon Kwack; Gyungock Kim
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Paper Abstract

We investigate the improvement of an insertion loss in silicon arrayed waveguide grating (AWG), by analyzing the multimode generation due to the field-mismatching effect. 8 channel silicon AWGs on a 6” SOI wafer are fabricated with an ultra-shallow etching structure and various aperture size of arrayed WGs. Our experimental results demonstrate the improved insertion loss and crosstalk characteristics. The fabricated AWG shows an insertion loss less than 1 dB with a crosstalk of -23.2 ~ -25.6 dB, exhibiting ~2.5 dB improvement of insertion loss and ~5 dB improvement of crosstalk, compared to our reported result.

Paper Details

Date Published: 27 February 2015
PDF: 6 pages
Proc. SPIE 9367, Silicon Photonics X, 936705 (27 February 2015); doi: 10.1117/12.2077408
Show Author Affiliations
Jaegyu Park, Electronics and Telecommunications Research Institute (Korea, Republic of)
Jiho Joo, Electronics and Telecommunications Research Institute (Korea, Republic of)
Hyundai Park, Electronics and Telecommunications Research Institute (Korea, Republic of)
Myung-Joon Kwack, Electronics and Telecommunications Research Institute (Korea, Republic of)
Gyungock Kim, Electronics and Telecommunications Research Institute (Korea, Republic of)


Published in SPIE Proceedings Vol. 9367:
Silicon Photonics X
Graham T. Reed; Michael R. Watts, Editor(s)

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