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Proceedings Paper

Finely control groove-depth variations of large-area diffraction gratings
Author(s): Lixiang Wu; Keqiang Qiu; Xiaolong Jiang; Yanchang Zheng; Xiangdong Xu; Yilin Hong; Shaojun Fu
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Paper Abstract

We proposed a technique for conducting on-the-fly fine adjustment of etch depths with sub-nanometer precision during the course of ion beam etching (IBE). Simulations were performed to evaluate the etch-depth control precision. The simulation prediction shows that the precision of fine control of etch depths is at the level of 0.1nm. The preliminary experiment was conducted. The early result and the simulation prediction are in agreement with each other, which indicates that this approach is feasible for finely controlling groove-depth variations of large-area diffraction gratings.

Paper Details

Date Published: 13 March 2015
PDF: 7 pages
Proc. SPIE 9374, Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII, 937411 (13 March 2015); doi: 10.1117/12.2077396
Show Author Affiliations
Lixiang Wu, Univ. of Science and Technology of China (China)
Keqiang Qiu, Univ. of Science and Technology of China (China)
Xiaolong Jiang, Univ. of Science and Technology of China (China)
Yanchang Zheng, Univ. of Science and Technology of China (China)
Xiangdong Xu, Univ. of Science and Technology of China (China)
Yilin Hong, Univ. of Science and Technology of China (China)
Shaojun Fu, Univ. of Science and Technology of China (China)


Published in SPIE Proceedings Vol. 9374:
Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VIII
Georg von Freymann; Winston V. Schoenfeld; Raymond C. Rumpf; Henry Helvajian, Editor(s)

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