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Proceedings Paper

Fabrication of SiC membrane HCG blue reflector using nanoimprint lithography
Author(s): Ying-Yu Lai; Akihiro Matsutani; Tien-Chang Lu; Shing-Chung Wang; Fumio Koyama
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Paper Abstract

We designed and fabricated a suspended SiC-based membrane high contrast grating (HCG) reflectors. The rigorous coupled-wave analysis (RCWA) was employed to verify the structural parameters including grating periods, grating height, filling factors and air-gap height. From the optimized simulation results, the designed SiC-based membrane HCG has a wide reflection stopband (reflectivity (R) <90%) of 135 nm for the TE polarization, which centered at 480 nm. The suspended SiC-based membrane HCG reflectors were fabricated by nanoimprint lithography and two-step etching technique. The corresponding reflectivity was measured by using a micro-reflectivity spectrometer. The experimental results show a high reflectivity (R<90%), which is in good agreement with simulation results. This achievement should have an impact on numerous III-N based photonic devices operating in the blue wavelength or even ultraviolet region.

Paper Details

Date Published: 27 February 2015
PDF: 6 pages
Proc. SPIE 9372, High Contrast Metastructures IV, 937207 (27 February 2015); doi: 10.1117/12.2077391
Show Author Affiliations
Ying-Yu Lai, National Chiao Tung Univ. (Taiwan)
Tokyo Institute of Technology (Japan)
Akihiro Matsutani, Tokyo Institute of Technology (Japan)
Tien-Chang Lu, National Chiao Tung Univ. (Taiwan)
Shing-Chung Wang, National Chiao Tung Univ. (Taiwan)
Fumio Koyama, Tokyo Institute of Technology (Japan)


Published in SPIE Proceedings Vol. 9372:
High Contrast Metastructures IV
Connie J. Chang-Hasnain; David Fattal; Fumio Koyama; Weimin Zhou, Editor(s)

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