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Proceedings Paper

Antireflection subwavelength gratings on optical fiber tips fabricated by a dedicated UV nano imprint lithography system
Author(s): Yoshiaki Kanamori; Masaaki Okochi; Kazuhiro Hane
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Paper Abstract

Antireflection (AR) layers at the tips of optical fibers are indispensable in order to reduce propagation loss and optical noise. Conventional thin-film AR layers have problems about cost due to vacuum apparatus usage in the fabrication and requirement of many thin-film layers to obtain excellent AR characteristics. Thus, easy AR coating methods are needed to reduce Fresnel reflection. AR structures consisting of subwavelength gratings (SWGs), which have periodic structures with the periods smaller than operating wavelengths, have been extensively investigated. Desired refractive index to realize the ideal AR condition can be obtained by SWGs. Nano imprint lithography (NIL) is known as the low cost fabrication technology of SWGs. However, it is difficult to carry out an NIL process on the tips of flexible and long optical fibers. In this study, we developed a dedicated UV-NIL system for optical fiber end-faces. An SWG with a period of 700 nm, a width of 560 nm, and a height of 250 nm was successfully fabricated at the tip of a single-mode optical fiber for optical communications system. We evaluated that reflectance decreased by using the SWG over measured spectral range. For example, reflectance decreased to 0.2% at a wavelength of 1550 nm.

Paper Details

Date Published: 27 February 2015
PDF: 7 pages
Proc. SPIE 9372, High Contrast Metastructures IV, 93720T (27 February 2015); doi: 10.1117/12.2075791
Show Author Affiliations
Yoshiaki Kanamori, Tohoku Univ. (Japan)
Masaaki Okochi, Tohoku Univ. (Japan)
Kazuhiro Hane, Tohoku Univ. (Japan)


Published in SPIE Proceedings Vol. 9372:
High Contrast Metastructures IV
Connie J. Chang-Hasnain; David Fattal; Fumio Koyama; Weimin Zhou, Editor(s)

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